Structure of 6-butyl-1,3-dioxo-1H-benzo[de]isoquinolin-2(3H)-yl trifluoromethanesulfonate CAS 1610827-31-0

6-butyl-1,3-dioxo-1H-benzo[de]isoquinolin-2(3H)-yl trifluoromethanesulfonate CAS 1610827-31-0

in , , , , , , ,

Identification

CAS Number

1610827-31-0

Name

6-butyl-1,3-dioxo-1H-benzo[de]isoquinolin-2(3H)-yl trifluoromethanesulfonate

Synonyms

1H-Benz[de]isoquinoline-1,3(2H)-dione, 6-butyl-2-[[(trifluoromethyl)sulfonyl]oxy]-
[Index name – generated by ACD/Name]
6-Butyl-2-{[(trifluormethyl)sulfonyl]oxy}-1H-benzo[de]isochinolin-1,3(2H)-dion
[German]
[IUPAC name – generated by ACD/Name]
6-Butyl-2-{[(trifluorométhyl)sulfonyl]oxy}-1H-benzo[de]isoquinoléine-1,3(2H)-dione
[French]
[IUPAC name – generated by ACD/Name]
6-Butyl-2-{[(trifluoromethyl)sulfonyl]oxy}-1H-benzo[de]isoquinoline-1,3(2H)-dione
[IUPAC name – generated by ACD/Name]

SMILES

CCCCc1ccc2c3c(cccc13)C(=O)N(OS(=O)(=O)C(F)(F)F)C2=O

StdInChI

InChI=1S/C17H14F3NO5S/c1-2-3-5-10-8-9-13-14-11(10)6-4-7-12(14)15(22)21(16(13)23)26-27(24,25)17(18,19)20/h4,6-9H,2-3,5H2,1H3

StdInChIKey

MCGHKIFMSZAFAV-UHFFFAOYSA-N

Molecular Formula

C17H14F3NO5S

Molecular Weight

401.355

Properties

Appearance

White to off-white powder

Safety Data

RIDADR 

NONH for all modes of transport

WGK Germany

3

Specifications and Other Information of Our 6-butyl-1,3-dioxo-1H-benzo[de]isoquinolin-2(3H)-yl trifluoromethanesulfonate CAS 1610827-31-0

Identification Methods

HNMR, HPLC

Purity

99%min, 99.5% min

Total metal impurities

＜100ppb, ＜50ppb

Shelf Life

2 years

Storage

Under room temperature away from light

Known Application

  1. Photoacid Generator (PAG) in Semiconductor Lithography
    The primary use of CAS 85342-62-7 is as a non-ionic photoacid generator (PAG) used in chemically amplified photoresists. Upon exposure to UV, DUV, or electron-beam radiation, it generates a strong acid that drives resist chemical reactions needed for pattern formation.
  2. Advanced Photoresist Systems
    It is widely used in:
    KrF (248 nm) photoresists
    ArF (193 nm) photoresists
    EUV resist research formulations
    High-resolution semiconductor lithography materials
    Its strong acid generation efficiency makes it suitable for fine pattern transfer in integrated circuit manufacturing.
  3. Microelectronics & Nanofabrication
    Used in:
    Integrated circuit (IC) fabrication
    MEMS manufacturing
    Nano-patterning processes
    Advanced electronic material development
    These applications rely on controlled acid generation and diffusion during exposure and post-exposure bake steps.
  4. UV / Radiation-Induced Polymer Chemistry
    Also used as a cationic photoinitiator, enabling:
    Cationic polymerization reactions
    UV-curable coatings and resins (in research/advanced formulations)
    Polymer surface modification systems

This product is developed by our R&D company Watson International Ltd (https://www.watson-int.com/).