Structure of BIS(CYCLOHEXYLSULFONYL)DIAZOMETHANE CAS 138529-81-4

BIS(CYCLOHEXYLSULFONYL)DIAZOMETHANE CAS 138529-81-4

in , , , , , , ,

Identification

CAS Number

138529-81-4

Name

BIS(CYCLOHEXYLSULFONYL)DIAZOMETHANE

Synonyms

BIS(CYCLOHEXYLSULFONYL)DIAZOMETHANE
[cyclohexylsulfonyl(diazo)methyl]sulfonylcyclohexane
bis(cyclohexyl sulfonyl)diazomethane
1,1′-[(Diazomethylene)disulfonyl]dicyclohexane

SMILES

C1CCC(CC1)S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)C2CCCCC2

StdInChI

InChI=1S/C13H22N2O4S2/c14-15-13(20(16,17)11-7-3-1-4-8-11)21(18,19)12-9-5-2-6-10-12/h11-12H,1-10H2

StdInChIKey

GLGXSTXZLFQYKJ-UHFFFAOYSA-N

Molecular Formula

C13H22N2O4S2

Molecular Weight

334.5

Properties

Appearance

White to off-white powder

Safety Data

RIDADR 

NONH for all modes of transport

WGK Germany

3

Specifications and Other Information of Our BIS(CYCLOHEXYLSULFONYL)DIAZOMETHANE CAS 138529-81-4

Identification Methods

HNMR, HPLC

Purity

99%min, 99.5% min

Total metal impurities

＜100ppb, ＜50ppb

Shelf Life

2 years

Storage

Under room temperature away from light

Known Application

  1. Photoacid Generator (PAG) for Semiconductor Lithography
    The primary application of CAS 138529-81-4 is as a photoacid generator (PAG) in chemically amplified photoresists used for semiconductor manufacturing. Upon deep-UV (DUV) exposure, the compound decomposes to generate acid, enabling high-resolution pattern formation during lithographic processing.
  2. DUV Photoresists
    Widely used in:
    KrF (248 nm) photoresists
    DUV lithography
    Semiconductor device fabrication
    Microelectronic patterning processes
    The product is specifically marketed for semiconductor photoresist applications by major electronic chemical suppliers.
  3. Chemically Amplified Resist Systems
    Used as an acid-generating component in:
    Positive-tone photoresists
    Negative-tone photoresists
    Radiation-sensitive resin compositions
    Advanced lithographic materials
    Numerous resist patents and publications reference diazodisulfone PAGs such as BCSD for high-resolution microfabrication.
  4. Microelectronics and Nanofabrication
    Applied in:
    Integrated circuit (IC) manufacturing
    MEMS fabrication
    Micro- and nano-patterning
    Advanced semiconductor process development
    Its high sensitivity and suitability for excimer-laser lithography make it valuable for fine-feature patterning technologies.

This product is developed by our R&D company Watson International Ltd (https://www.watson-int.com/).