Structure of Naphthalimidyltrifluromethan sulfornate CAS 171417-91-7

Naphthalimidyltrifluromethan sulfornate CAS 171417-91-7

in , , , , , ,

Identification

CAS Number

171417-91-7

Name

Naphthalimidyltrifluromethan sulfornate

Synonyms

1H-Benz[de]isoquinoline-1,3(2H)-dione,2-[[(nonafluorobutyl)sulfonyl]oxy]-
N-Nonafluorobutanesulfonyloxy-1,8-naphthalimide
Naphthalimidyltrifluromethan Sulfornate

SMILES

O=C1c2cccc3cccc(c23)C(=O)N1OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

StdInChI

InChI=1S/C16H6F9NO5S/c17-13(18,15(21,22)23)14(19,20)16(24,25)32(29,30)31-26-11(27)8-5-1-3-7-4-2-6-9(10(7)8)12(26)28/h1-6H

StdInChIKey

LDQBXAADVARGKQ-UHFFFAOYSA-N

Molecular Formula

C16H6F9NO5S

Molecular Weight

495.268

Properties

Appearance

White to off-white powder

Safety Data

RIDADR 

NONH for all modes of transport

WGK Germany

3

Specifications and Other Information of Our Naphthalimidyltrifluromethan sulfornate CAS 171417-91-7

Identification Methods

HNMR, HPLC

Purity

99%min, 99.5% min

Total metal impurities

＜100ppb, ＜50ppb

Shelf Life

2 years

Storage

Under room temperature away from light

Known Application

  1. Photoacid Generator (PAG) in Semiconductor Lithography
    The primary use of CAS 85342-62-7 is as a non-ionic photoacid generator (PAG) used in chemically amplified photoresists. Upon exposure to UV, DUV, or electron-beam radiation, it generates a strong acid that drives resist chemical reactions needed for pattern formation.
  2. Advanced Photoresist Systems
    It is widely used in:
    KrF (248 nm) photoresists
    ArF (193 nm) photoresists
    EUV resist research formulations
    High-resolution semiconductor lithography materials
    Its strong acid generation efficiency makes it suitable for fine pattern transfer in integrated circuit manufacturing.
  3. Microelectronics & Nanofabrication
    Used in:
    Integrated circuit (IC) fabrication
    MEMS manufacturing
    Nano-patterning processes
    Advanced electronic material development
    These applications rely on controlled acid generation and diffusion during exposure and post-exposure bake steps.
  4. UV / Radiation-Induced Polymer Chemistry
    Also used as a cationic photoinitiator, enabling:
    Cationic polymerization reactions
    UV-curable coatings and resins (in research/advanced formulations)
    Polymer surface modification systems

This product is developed by our R&D company Watson International Ltd (https://www.watson-int.com/).