Structure of Sulfonium, triphenyl-, salt with 2-sulfoethyl tricyclo[3.3.1.13,7]decane-1-carboxylate (11) CAS 1228823-28-6

Sulfonium, triphenyl-, salt with 2-sulfoethyl tricyclo[3.3.1.13,7]decane-1-carboxylate (1:1) CAS 1228823-28-6

in ,

Identification

CAS Number

1228823-28-6

Name

Sulfonium, triphenyl-, salt with 2-sulfoethyl tricyclo[3.3.1.13,7]decane-1-carboxylate (1:1)

Synonyms

Triphenylsulfonium 2-[(Adamantane-1-carbonyl)oxy]ethanesulfonate
triphenylsulfonium 2-(adamantane-1-carbonyloxy)ethanesulfonate

SMILES

C1C2CC3CC1CC(C2)(C3)C(=O)OCCS(=O)(=O)[O-].C1=CC=C(C=C1)[S+](C2=CC=CC=C2)C3=CC=CC=C3

StdInChI

InChI=1S/C18H15S.C13H20O5S/c1-4-10-16(11-5-1)19(17-12-6-2-7-13-17)18-14-8-3-9-15-18;14-12(18-1-2-19(15,16)17)13-6-9-3-10(7-13)5-11(4-9)8-13/h1-15H;9-11H,1-8H2,(H,15,16,17)/q+1;/p-1

StdInChIKey

WYYSEXOKTYXQKL-UHFFFAOYSA-M

Molecular Formula

C31H34O5S2

Molecular Weight

550.7

Properties

Appearance

White to off-white powder

Safety Data

RIDADR 

NONH for all modes of transport

Specifications and Other Information of Our Sulfonium, triphenyl-, salt with 2-sulfoethyl tricyclo[3.3.1.13,7]decane-1-carboxylate (1:1) CAS 1228823-28-6

Identification Methods

HNMR, HPLC

Purity

99% min, 99.5% min

Total Heavy Metals Impurities

＜100ppb,＜50ppb

Shelf Life

2 years

Storage

Under room temperature away from light

Known Application

I. Core Function: Photoacid Generator (PAG)
This compound is a triphenylsulfonium salt-based photoacid generator (PAG). Under UV or deep-UV (DUV) irradiation:
It absorbs light and undergoes photolytic cleavage
Produces a strong acid (difluoromethanesulfonic acid)
The generated acid can catalyze chemically amplified reactions or initiate subsequent cationic polymerization. It is a key functional additive in photoresist and cationic photopolymer curing systems.
II. Main Application Areas
1.Semiconductor Photoresists (Chemically Amplified Photoresists, CARs)
Applicable to:
i-line, KrF, and ArF lithography systems
High-resolution chemically amplified photoresists
Main functions:
Acid generation upon exposure
Catalyzes deprotection reactions
Amplifies exposure effects → improves resolution, sensitivity, and critical dimension / line edge roughness (CD/LER) control
Advantages of the adamantyl structure:
Provides high thermal stability
Reduces acid diffusion → improves resolution and line edge roughness
Enhances optical performance and formulation stability of photoresists

  1. Cationic Photocuring Systems
    Used in UV-induced cationic curing of epoxy resins and vinyl ether materials
    UV irradiation → acid generation → initiates cationic ring-opening polymerization or crosslinking
    Applications include:
    UV-curable coatings and inks
    Electronic encapsulation materials
    Photo-patternable insulating layers (e.g., PSPI, PI)

This product is developed by our R&D company Watson International Ltd (https://www.watson-int.com/).