Sulfonium, triphenyl-, salt with 3,3,4,4-tetrafluoro-4-sulfobutyl tricyclo[3.3.1.13,7]decane-1-carboxylate (1:1) CAS 1001347-91-6

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• Properties
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Identification

CAS Number

1001347-91-6

Name

Sulfonium, triphenyl-, salt with 3,3,4,4-tetrafluoro-4-sulfobutyl tricyclo[3.3.1.13,7]decane-1-carboxylate (1:1)

Synonyms

1,1,2,2-tétrafluoro-4-[(tricyclo[3.3.1.1~3,7~]décane-1-carbonyl)oxy]butane-1-sulfonate de triphénylsulfanium[French]
[IUPAC name – generated by ACD/Name]
triphenylsulfanium 1,1,2,2-tetrafluoro-4-[(tricyclo[3.3.1.1~3,7~]decane-1-carbonyl)oxy]butane-1-sulfonate
[IUPAC name – generated by ACD/Name]
Triphenylsulfanium-1,1,2,2-tetrafluor-4-[(tricyclo[3.3.1.1~3,7~]decan-1-carbonyl)oxy]butan-1-sulfonat
[German]
[IUPAC name – generated by ACD/Name]
4-(adamantane-1-carbonyloxy)-1,1,2,2-tetrafluoro-butane-1-sulfonate;triphenylsulfonium
Triphenylsulfonium 4-((adamantane-1-carbonyl)oxy)-1,1,2,2-tetrafluorobutane-1-sulfonate

SMILES

O=C(OCCC(F)(F)C(F)(F)S(=O)(=O)[O-])C12CC3CC(CC(C3)C1)C2.c1ccc(S+c2ccccc2)cc1

StdInChI

InChI=1S/C18H15S.C15H20F4O5S/c1-4-10-16(11-5-1)19(17-12-6-2-7-13-17)18-14-8-3-9-15-18;16-14(17,15(18,19)25(21,22)23)1-2-24-12(20)13-6-9-3-10(7-13)5-11(4-9)8-13/h1-15H;9-11H,1-8H2,(H,21,22,23)/q+1;/p-1

StdInChIKey

InChI=1S/C18H15S.C15H20F4O5S/c1-4-10-16(11-5-1)19(17-12-6-2-7-13-17)18-14-8-3-9-15-18;16-14(17,15(18,19)25(21,22)23)1-2-24-12(20)13-6-9-3-10(7-13)5-11(4-9)8-13/h1-15H;9-11H,1-8H2,(H,21,22,23)/q+1;/p-1

Molecular Formula

C33H34F4O5S2

Molecular Weight

650.742

Properties

Appearance

White to off-white powder

Safety Data

RIDADR 

NONH for all modes of transport

WGK Germany

3

Specifications and Other Information of Our Sulfonium, triphenyl-, salt with 3,3,4,4-tetrafluoro-4-sulfobutyl tricyclo[3.3.1.13,7]decane-1-carboxylate (1:1) CAS 1001347-91-6

Identification Methods

HNMR, HPLC

Purity

99% min, 99.5% min

Total Metallic Impurities

＜100ppb; ＜50ppb

Shelf Life

1 year

Storage

Under room temperature away from light

Known Application

Main Uses
1.Serves as a photoacid generator (PAG) in chemically amplified photoresists, mainly used for semiconductor lithography processes such as KrF (248 nm) and ArF (193 nm) exposure, to realize high-resolution pattern formation for integrated circuits and advanced chip manufacturing.
2.Applied in electronics imaging materials including LCD panels, printing plates, photocurable coatings and inks, providing high sensitivity and thermal stability.
3.Used as a photochemical reagent in organic synthesis and laboratory R&D, for light-triggered acid-catalyzed reactions in fine chemical preparation.

Links

This product is developed by our R&D company WatsonChem Advanced Chemical Materials (https://www.watsonchem.com/).

This product is developed by our R&D company Watson International Ltd (https://www.watson-int.com/).