TBPDPS-PFBS CAS 258872-05-8

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• Properties
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Identification

CAS Number

258872-05-8

Name

TBPDPS-PFBS

Synonyms

Di-p-tolyl iodonium salt: perfluorobutyl sulphonate (1:1)
Diphenyl 4-tertbutylphenylsulfonium nonafluorobutanesulfonate
(4-tert-butylphenyl)-diphenylsulfanium;1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate
(4-(tert-Butyl)phenyl)diphenylsulfonium 1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate
Diphenyl 4-tert-butylphenylsulfonium nonafluorobutanesulfonate
Sulfonium, [4-(1,1-Dimethylethyl)Phenyl]Diphenyl-,1,1,2,2,3,3,4,4,4-Nonafluoro-1-Butanesulfonate (1:1)

SMILES

CC(C)(C)C1=CC=C(C=C1)S+C3=CC=CC=C3.C(C(C(F)(F)S(=O)(=O)[O-])(F)F)(C(F)(F)F)(F)F

StdInChI

InChI=1S/C22H23S.C4HF9O3S/c1-22(2,3)18-14-16-21(17-15-18)23(19-10-6-4-7-11-19)20-12-8-5-9-13-20;5-1(6,3(9,10)11)2(7,8)4(12,13)17(14,15)16/h4-17H,1-3H3;(H,14,15,16)/q+1;/p-1

StdInChIKey

GXZZZWUTJCPYHC-UHFFFAOYSA-M

Molecular Formula

C₂₆H₂₃F₉O₃S₂

Molecular Weight

618.6

Properties

Appearance

White to off-white powder

Safety Data

RIDADR 

NONH for all modes of transport

WGK Germany

3

Specifications and Other Information of Our TBPDPS-PFBS CAS 258872-05-8

Identification Methods

HNMR, HPLC

Purity

99%min, 99.5% min

Total metal impurities

＜100ppb, ＜50ppb

Shelf Life

2 years

Storage

Under room temperature away from light

Known Application

1. Semiconductor Photolithography
   Its primary use is as a photoacid generator in chemically amplified photoresists used for semiconductor fabrication. Upon exposure to UV, DUV, electron-beam, or EUV radiation, it generates a strong acid that drives resist chemistry and pattern formation.
2. Advanced Photoresist Formulations
   Used in:
   Deep UV (DUV) photoresists
   EUV photoresists
   Electron-beam resists
   Microelectronic patterning materials
   The nonafluorobutanesulfonate counterion provides strong acidity while helping control acid diffusion, an important factor for high-resolution lithography.
3. MEMS and Microfabrication
   Applied in:
   MEMS device manufacturing
   Microfluidic device fabrication
   High-resolution micro-patterning
   Specialty electronic materials research
4. UV-Curable Materials Research
   Sulfonium PAGs such as this compound are investigated for:
   UV-curable coatings
   Optical materials
   Functional polymers
   Crosslinking and polymer modification chemistry

Links

This product is developed by our R&D company Watson International Ltd (https://www.watson-int.com/).