Structure of Triphenyl sulfonium 1,1,3,3,3-pentafluoro-2-(3-(N-phenylamino))propionyloxy-1-sulfonate CAS 1451961-31-1

Triphenyl sulfonium 1,1,3,3,3-pentafluoro-2-(3-(N-phenylamino))propionyloxy-1-sulfonate CAS 1451961-31-1

in , , ,

Identification

CAS Number

1451961-31-1

Name

Triphenyl sulfonium 1,1,3,3,3-pentafluoro-2-(3-(N-phenylamino))propionyloxy-1-sulfonate

Synonyms

1,1,3,3,3-pentafluoro-2-[(N-phényl-β-alanyl)oxy]propane-1-sulfonate de triphénylsulfanium
[French]
[IUPAC name – generated by ACD/Name]
triphenylsulfanium 1,1,3,3,3-pentafluoro-2-[(N-phenyl-β-alanyl)oxy]propane-1-sulfonate
[IUPAC name – generated by ACD/Name]
Triphenylsulfanium-1,1,3,3,3-pentafluor-2-[(N-phenyl-β-alanyl)oxy]propan-1-sulfonat
[German]
[IUPAC name – generated by ACD/Name]
Unverified
1162835-05-3
[RN]
1451961-31-1
[RN]
2-(3-anilinopropanoyloxy)-1,1,3,3,3-pentafluoro-propane-1-sulfonate triphenylsulfonium

SMILES

O=C(CCNc1ccccc1)OC(C(F)(F)F)C(F)(F)S(=O)(=O)[O-].c1ccc(S+c2ccccc2)cc1

StdInChI

InChI=1S/C18H15S.C12H12F5NO5S/c1-4-10-16(11-5-1)19(17-12-6-2-7-13-17)18-14-8-3-9-15-18;13-11(14,15)10(12(16,17)24(20,21)22)23-9(19)6-7-18-8-4-2-1-3-5-8/h1-15H;1-5,10,18H,6-7H2,(H,20,21,22)/q+1;/p-1

StdInChIKey

IYSBZYRFIILSDC-UHFFFAOYSA-M

Molecular Formula

C30H26F5NO5S2

Molecular Weight

639.650

Properties

Appearance

White to off-white powder

Safety Data

RIDADR 

NONH for all modes of transport

WGK Germany

3

Specifications and Other Information of Our Triphenyl sulfonium 1,1,3,3,3-pentafluoro-2-(3-(N-phenylamino))propionyloxy-1-sulfonate CAS 1451961-31-1

Identification Methods

HNMR, HPLC

Purity

99%min, 99.5% min

Total metal impurities

＜100ppb, ＜50ppb

Shelf Life

2 years

Storage

Under room temperature away from light

Known Application

This product is primarily used as a photoacid generator (PAG) in chemically amplified photoresist systems for advanced semiconductor lithography. Upon exposure to UV or deep ultraviolet (DUV) light, it generates strong acids that initiate catalytic deprotection reactions in photoresist materials, enabling high-resolution pattern formation.

Typical applications include:
Semiconductor photoresist formulations
Integrated circuit (IC) manufacturing
Advanced lithography processes (DUV / ArF)
Microelectronic and nanofabrication technologies
Chemically amplified resist (CAR) systems
Advanced packaging applications
Electronic and optoelectronic materials

This type of sulfonium salt PAG is widely used due to its high acid generation efficiency, good thermal stability, and suitability for advanced-node lithography processes requiring high resolution and low line-edge roughness.

This product is developed by our R&D company Watson International Ltd (https://www.watson-int.com/).