Structure of triphenylsulfonium 2-(adamantane-1-carbonyloxy)-3,3,3-trifluoro-2-trifluoromethylpropane-1-sulfonate CAS 1240248-58-1

triphenylsulfonium 2-(adamantane-1-carbonyloxy)-3,3,3-trifluoro-2-trifluoromethylpropane-1-sulfonate CAS 1240248-58-1

in , , , , ,

Identification

CAS Number

1240248-58-1

Name

triphenylsulfonium 2-(adamantane-1-carbonyloxy)-3,3,3-trifluoro-2-trifluoromethylpropane-1-sulfonate

Synonyms

triphenylsulfonium 2-(adamantane-1-carbonyloxy)-3,3,3-trifluoro-2-trifluoromethylpropane-1-sulfonate
SCHEMBL3790171
PSBGRAQOTNFWAQ-UHFFFAOYSA-M
PSBGRAQOTNFWAQ-UHFFFAOYSA-N
1240248-58-1
Triphenylsulfonium 2-((adamantane-1-carbonyl)oxy)-3,3,3-trifluoro-2-(trifluoromethyl)propane-1-sulfonate

SMILES

C1C2CC3CC1CC(C2)(C3)C(=O)OC(CS(=O)(=O)[O-])(C(F)(F)F)C(F)(F)F.C1=CC=C(C=C1)S+C3=CC=CC=C3

StdInChI

InChI=1S/C18H15S.C12H16O4/c1-4-10-16(11-5-1)19(17-12-6-2-7-13-17)18-14-8-3-9-15-18;13-10(14)11(15)16-12-4-7-1-8(5-12)3-9(2-7)6-12/h1-15H;7-9H,1-6H2,(H,13,14)/q+1;/p-1

StdInChIKey

PSBGRAQOTNFWAQ-UHFFFAOYSA-M

Molecular Formula

C33H32F6O5S2

Molecular Weight

686.7

Properties

Appearance

White to off-white powder

Safety Data

RIDADR 

NONH for all modes of transport

WGK Germany

3

Specifications and Other Information of Our triphenylsulfonium 2-(adamantane-1-carbonyloxy)-3,3,3-trifluoro-2-trifluoromethylpropane-1-sulfonate CAS 1240248-58-1

Identification Methods

HNMR, HPLC

Purity

99%min, 99.5% min

Total metal impurities

＜100ppb, ＜50ppb

Shelf Life

2 years

Storage

Under room temperature away from light

Known Application

This product is primarily used as a photoacid generator (PAG) in chemically amplified photoresist systems for advanced semiconductor lithography. Upon exposure to UV or deep ultraviolet (DUV) light, it generates strong acids that initiate catalytic deprotection reactions in photoresist materials, enabling high-resolution pattern formation.

Typical applications include:
Semiconductor photoresist formulations
Integrated circuit (IC) manufacturing
Advanced lithography processes (DUV / ArF)
Microelectronic and nanofabrication technologies
Chemically amplified resist (CAR) systems
Advanced packaging applications
Electronic and optoelectronic materials

This type of sulfonium salt PAG is widely used due to its high acid generation efficiency, good thermal stability, and suitability for advanced-node lithography processes requiring high resolution and low line-edge roughness.

This product is developed by our R&D company Watson International Ltd (https://www.watson-int.com/).