Triphenylsulfonium 3,3,3-trifluoro-2-hy-droxy-2-trifluoromethylpropionate CAS 365971-74-0
Identification
CAS Number
365971-74-0
Name
Triphenylsulfonium 3,3,3-trifluoro-2-hy-droxy-2-trifluoromethylpropionate
Synonyms
3,3,3-trifluoro-2-hydroxy-2-(trifluorométhyl)propanoate de triphénylsulfanium
[French]
[IUPAC name – generated by ACD/Name]
triphenylsulfanium 3,3,3-trifluoro-2-hydroxy-2-(trifluoromethyl)propanoate
[IUPAC name – generated by ACD/Name]
Triphenylsulfanium-3,3,3-trifluor-2-hydroxy-2-(trifluormethyl)propanoat
[German]
[IUPAC name – generated by ACD/Name]
Unverified
3,3,3-trifluoro-2-hydroxy-2-(trifluoromethyl)propanoate triphenylsulfonium
3,3,3-trifluoro-2-hydroxy-2-(trifluoromethyl)propanoate;triphenylsulfonium
365971-74-0
[RN]
Triphenylsulfonium 3,3,3-trifluoro-2-hydroxy-2-(trifluoromethyl)propanoate
SMILES
O=C([O-])C(O)(C(F)(F)F)C(F)(F)F.c1ccc(S+c2ccccc2)cc1
StdInChI
O=C([O-])C(O)(C(F)(F)F)C(F)(F)F.c1ccc(S+c2ccccc2)cc1
StdInChIKey
GHOSQFOBODXTJJ-UHFFFAOYSA-M
Molecular Formula
C22H16F6O3S
Molecular Weight
474.415
Properties
Appearance
White to off-white powder
Safety Data
RIDADR
NONH for all modes of transport
WGK Germany
3
Specifications and Other Information of Our Triphenylsulfonium 3,3,3-trifluoro-2-hy-droxy-2-trifluoromethylpropionate CAS 365971-74-0
Identification Methods
HNMR, HPLC
Purity
99%min, 99.5% min
Total metal impurities
＜100ppb, ＜50ppb
Shelf Life
2 years
Storage
Under room temperature away from light
Known Application
This product is primarily used as a photoacid generator (PAG) in chemically amplified photoresist systems for advanced semiconductor lithography. Upon exposure to UV or deep ultraviolet (DUV) light, it generates strong acids that initiate catalytic deprotection reactions in photoresist materials, enabling high-resolution pattern formation.
Typical applications include:
Semiconductor photoresist formulations
Integrated circuit (IC) manufacturing
Advanced lithography processes (DUV / ArF)
Microelectronic and nanofabrication technologies
Chemically amplified resist (CAR) systems
Advanced packaging applications
Electronic and optoelectronic materials
This type of sulfonium salt PAG is widely used due to its high acid generation efficiency, good thermal stability, and suitability for advanced-node lithography processes requiring high resolution and low line-edge roughness.
Links
This product is developed by our R&D company Watson International Ltd (https://www.watson-int.com/).
