Structure of Triphenylsulfonium triflate CAS 66003-78-9

Triphenylsulfonium triflate CAS 66003-78-9

Identification

CAS Number

66003-78-9

Name

Triphenylsulfonium triflate

Synonyms

TPST
Trifluorométhanesulfonate de triphénylsulfonium
Triphenylsulfonium triflate
Triphenylsulfonium trifluoromethanesulfonate
Triphenylsulfoniumtrifluormethansulfonat
TPST; Triphenylsulfonium trifluoromethanesulfonate
triphenyl sulfonium triflate
TRIPHENYLSULFANIUM TRIFLUOROMETHANESULFONATE
triphenylsulfonium (trifluoromethanesulfonate)
triphenylsulfonium trifluoromethane sulfonate
TRIPHENYLSULFONIUMTRIFLUOROMETHANESULFONATE
Triphenylsulphonium triflate

SMILES

O=S(=O)([O-])C(F)(F)F.c1ccc(S+c2ccccc2)cc1

StdInChI

InChI=1S/C18H15S.CHF3O3S/c1-4-10-16(11-5-1)19(17-12-6-2-7-13-17)18-14-8-3-9-15-18;2-1(3,4)8(5,6)7/h1-15H;(H,5,6,7)/q+1;/p-1

StdInChIKey

FAYMLNNRGCYLSR-UHFFFAOYSA-M

Molecular Formula

C19H15F3O3S2

Molecular Weight

412.440

MDL Number

MFCD01940916

Properties

Appearance

White to off-white powder

Safety Data

Symbol

exclamation-mark-jpgGHS07

Signal Word

Warning

Hazard statements

H315,H319

Precautionary Statements

P264 – P280 – P302 + P352 – P305 + P351 + P338 – P332 + P313 – P337 + P313

RIDADR 

NONH for all modes of transport

Specifications and Other Information of Our Triphenylsulfonium triflate CAS 66003-78-9

Identification Methods

HNMR, HPLC

Purity

99% min, 99.5% min

Total metal impurities

<100ppb, <50ppb

Shelf Life

2 years

Storage

Under room temperature away from light

Known Application

1.Semiconductor Photolithography: Used in chemically amplified photoresists for integrated circuit (IC) fabrication, MEMS manufacturing, and microelectronic patterning. 2.Photoresist Formulations: Serves as a PAG in UV and deep-UV (DUV) photoresists, generating a strong acid upon irradiation to enable high-resolution pattern development. 3.UV-Curable Materials: Functions as a cationic photoinitiator for UV-curable coatings, inks, adhesives, and epoxy resin systems. 4.Polymerization Processes: Initiates cationic polymerization of epoxides, vinyl ethers, and other radiation-curable monomers. 5.Electronic and Optoelectronic Materials: Utilized in the development of OLEDs, advanced electronic materials, and other photochemical research applications.

This product is developed by our R&D company Watson International Ltd (https://www.watson-int.com/).